Invention Grant
- Patent Title: Microelectromechanical system and fabricating process having decoupling structure that includes attaching element for fastening to carrier
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Application No.: US15273423Application Date: 2016-09-22
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Publication No.: US09731958B2Publication Date: 2017-08-15
- Inventor: Fabien Filhol , Pierre-Olivier Lefort , Bertrand Leverrier , Régis Quer , Bernard Chaumet
- Applicant: THALES
- Applicant Address: FR Courbevoie
- Assignee: THALES
- Current Assignee: THALES
- Current Assignee Address: FR Courbevoie
- Agency: Baker & Hostetler LLP
- Priority: FR1502178 20151016
- Main IPC: B81B7/00
- IPC: B81B7/00 ; B81C3/00 ; B81C1/00 ; H01L23/10

Abstract:
A microelectromechanical system comprising an assembly of layers stacked in a stacking direction comprises an active layer made of single-crystal silicon comprising an active structure, and first and second covers defining a cavity around the active structure, the active layer interposed between the first and second covers, the second cover comprising a single layer made of single-crystal silicon. The assembly comprises a decoupling layer made of single-crystal silicon and comprising: an attaching element fastened to a carrier, a frame encircling the attaching element in the plane of the decoupling layer, and a mechanical decoupling structure connecting the frame and the attaching structure, the mechanical decoupling structure allowing the attaching element to be flexibly joined to the frame. The frame is secured to the silicon layer of the second cover and at most one film of silicon dioxide is interposed between the frame and silicon layer of the second cover.
Public/Granted literature
- US20170107098A1 MICROELECTROMECHANICAL SYSTEM AND FABRICATING PROCESS Public/Granted day:2017-04-20
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