Invention Grant
- Patent Title: Scatterometry overlay metrology targets and methods
-
Application No.: US14457780Application Date: 2014-08-12
-
Publication No.: US09740108B2Publication Date: 2017-08-22
- Inventor: Nuriel Amir
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B26/10

Abstract:
Scatterometry overlay (SCOL) targets as well as design, production and measurement methods thereof are provided. The SCOL targets have several periodic structures at different measurement directions which share some of their structural target elements or parts thereof. An array of common elements may have symmetry directions which are parallel to the measurement directions and thus enable compacting the targets or alternatively increasing the area use efficiency of the targets. Various configurations enable high flexibility in arranging the number of layers in the target and measurement directions, and carrying out respective overlay measurements among the layers.
Public/Granted literature
- US20140351771A1 SCATTEROMETRY OVERLAY METROLOGY TARGETS AND METHODS Public/Granted day:2014-11-27
Information query
IPC分类: