Invention Grant
- Patent Title: Photoresist composition and method of manufacturing black matrix using the same
-
Application No.: US14881815Application Date: 2015-10-13
-
Publication No.: US09746767B2Publication Date: 2017-08-29
- Inventor: Ki Beom Lee , Hyun-Seok Kim , Hi Kuk Lee , Jae Hyuk Chang
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2015-0002205 20150107
- Main IPC: G03F7/031
- IPC: G03F7/031 ; G03F7/00 ; G03F7/20 ; G03F7/32

Abstract:
A photoresist composition including 5 wt % to 10 wt % of a binder resin, 5 wt % to 10 wt % of a photopolymerization monomer, 1 wt % to 5 wt % of a photopolymerization initiator comprising an oxime ester-based compound and activated by light in a wavelength range of 400 nm to 410 nm, 5 wt % to 10 wt % of a black coloring agent, and a residual amount of a solvent.
Public/Granted literature
- US20160195806A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING BLACK MATRIX USING THE SAME Public/Granted day:2016-07-07
Information query
IPC分类: