A method for modifying an integrated circuit layout design includes providing an initial multiple-patterned circuit layout design comprising a first pattern exposure and a second pattern exposure; modifying the initial multiple-patterned circuit layout design by providing a subresolution assist feature to the first pattern exposure; determining whether the presence of any overlapping areas between the subresolution assist feature of the first pattern exposure and the second pattern exposure; and further modifying the initial multiple-patterned circuit layout design by: maintaining the size of any portion of the subresolution assist feature in the overlapping areas; and shrinking the size of any portion of the subresolution assist feature that is not in the overlapping areas.