Invention Grant
- Patent Title: Methods for measuring overlays
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Application No.: US14940880Application Date: 2015-11-13
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Publication No.: US09747682B2Publication Date: 2017-08-29
- Inventor: Jeongjin Lee , Chan Hwang , Seungyoon Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2013-0025091 20130308
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G03F7/20 ; H04N5/225 ; H04N5/33 ; G06T7/174

Abstract:
A method for measuring overlay includes receiving a first image of a first overlay mark captured using light having a first wavelength. The method includes receiving a second image of a second overlay mark captured using light having a second wavelength different from the first wavelength. The method includes measuring a displacement between a central portion of the first image and a central portion of the second image, wherein the first and second overlay marks are disposed on different levels.
Public/Granted literature
- US20160071255A1 METHODS FOR MEASURING OVERLAYS Public/Granted day:2016-03-10
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