- 专利标题: Charged particle source
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申请号: US15404694申请日: 2017-01-12
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公开(公告)号: US09754760B2公开(公告)日: 2017-09-05
- 发明人: Shuai Li
- 申请人: Hermes Microvision Inc.
- 申请人地址: TW Hsinchu
- 专利权人: HERMES MICROVISION INC.
- 当前专利权人: HERMES MICROVISION INC.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
- 主分类号: H01J37/143
- IPC分类号: H01J37/143 ; H01J37/28 ; H01J37/09
摘要:
This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
公开/授权文献
- US20170125204A1 Charged Particle Source 公开/授权日:2017-05-04