Invention Grant
- Patent Title: Semiconductor package and fabrication method thereof
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Application No.: US13922828Application Date: 2013-06-20
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Publication No.: US09754898B2Publication Date: 2017-09-05
- Inventor: Mu-Hsuan Chan , Wan-Ting Chen , Chun-Tang Lin , Yi-Che Lai
- Applicant: Siliconware Precision Industries Co., Ltd.
- Applicant Address: TW Taichung
- Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee Address: TW Taichung
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless; Steven M. Jensen
- Priority: TW101135243A 20120926
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/00 ; H01L23/31 ; H01L21/56

Abstract:
A semiconductor package is provided, which includes: a carrier; at least an interposer disposed on the carrier; an encapsulant formed on the carrier for encapsulating the interposer while exposing a top surface of the interposer; a redistribution layer formed on the encapsulant and the top surface of the interposer; and at least a semiconductor element disposed on the redistribution layer. The top surface of the interposer is flush with a surface of the encapsulant so as for the redistribution layer to have a planar surface for disposing the semiconductor element, thereby preventing warpage of the interposer and improving the reliability of electrical connection between the redistribution layer and the semiconductor element.
Public/Granted literature
- US20140084484A1 SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF Public/Granted day:2014-03-27
Information query
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