发明授权
- 专利标题: Semiconductor devices including insulating gates and methods for fabricating the same
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申请号: US15000495申请日: 2016-01-19
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公开(公告)号: US09755079B2公开(公告)日: 2017-09-05
- 发明人: Sang-Jine Park , Keun-Hee Bai , Kyoung-Hwan Yeo , Bo-Un Yoon , Kee-Sang Kwon , Do-Hyoung Kim , Ha-Young Jeon , Seung-Seok Ha
- 申请人: Sang-Jine Park , Keun-Hee Bai , Kyoung-Hwan Yeo , Bo-Un Yoon , Kee-Sang Kwon , Do-Hyoung Kim , Ha-Young Jeon , Seung-Seok Ha
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Ward and Smith, P.A.
- 优先权: KR10-2015-0025303 20150223
- 主分类号: H01L27/088
- IPC分类号: H01L27/088 ; H01L29/78 ; H01L29/49 ; H01L29/423 ; H01L29/06 ; H01L27/092 ; H01L27/12
摘要:
Semiconductor devices are provided including a first active fin extending in a first direction and a second active fin spaced apart from the first active fin in a second direction perpendicular to the first direction, the second active fin extending in the first direction, the second active fin having a longer side shorter than a length of a longer side of the first active fin. A first dummy gate extends in the second direction overlapping a first end of each of the first and second active fins. A first metal gate extends in the second direction intersecting the first active fin and overlapping a second end of the second active fin. A first insulating gate extends in the second direction intersecting the first active fin. The first insulating gate extends into the first active fin.
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