Invention Grant
- Patent Title: Mask for deposition and method for aligning the same
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Application No.: US13950595Application Date: 2013-07-25
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Publication No.: US09757764B2Publication Date: 2017-09-12
- Inventor: Jae-Min Hong , Sang-Hyuk Park , Woo-Young Jung , Ha-Nul Kwen , Suk-Ho Kang , Jeong-Yeol Lee
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Samsung-ro, Giheung-Gu, Yongin-si, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Samsung-ro, Giheung-Gu, Yongin-si, Gyeonggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2012-0084200 20120731
- Main IPC: C23C14/00
- IPC: C23C14/00 ; B05C21/00 ; C23C14/04 ; H01L51/00

Abstract:
A mask for deposition for forming a pattern on a transparent substrate according to the present invention includes a mask member having a mask alignment mark penetratedly formed so as to be aligned with a substrate alignment mark formed on the transparent substrate; and an unevenness region formed on one surface of the mask member so as to be adjacent to the mask alignment mark and having protrusions and depressions on a surface thereof. In accordance with embodiments of the present invention, it is possible to prevent the alignment error of the mask from occurring by increasing the recognition rate of the align marks formed on the substrate and the mask. As a result, it is possible to reduce the manufacturing costs by reducing the defective rate of the organic light emitting diode (OLED) display device.
Public/Granted literature
- US20140033974A1 MASK FOR DEPOSITION AND METHOD FOR ALIGNING THE SAME Public/Granted day:2014-02-06
Information query
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