Invention Grant
- Patent Title: Composition for metal electroplating comprising leveling agent
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Application No.: US14438688Application Date: 2013-10-30
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Publication No.: US09758885B2Publication Date: 2017-09-12
- Inventor: Marcel Patrik Kienle , Dieter Mayer , Cornelia Roeger-Goepfert , Alexandra Haag , Charlotte Emnet , Alexander Fluegel , Marco Arnold
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/IB2013/059777 WO 20131030
- International Announcement: WO2014/072885 WO 20140515
- Main IPC: C25D3/56
- IPC: C25D3/56 ; C25D3/58 ; C25D3/00 ; C25D3/38 ; C25D3/32 ; C23C18/38

Abstract:
A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant, wherein D6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical, D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, and R2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, and D8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, s is an integer from 1 to 250, R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.
Public/Granted literature
- US20150284865A1 COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT Public/Granted day:2015-10-08
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