Invention Grant
- Patent Title: Lithography system and method for processing a target, such as a wafer
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Application No.: US14383570Application Date: 2013-03-08
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Publication No.: US09760028B2Publication Date: 2017-09-12
- Inventor: Niels Vergeer
- Applicant: MAPPER LITHOGRAPHY IP B.V.
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Rokh Monegier LLP
- Agent David P. Owen
- International Application: PCT/EP2013/054782 WO 20130308
- International Announcement: WO2013/132081 WO 20130912
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F9/00 ; H01J37/317 ; B82Y10/00 ; B82Y40/00 ; H01J37/304

Abstract:
A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck.
Public/Granted literature
- US20150109598A1 LITHOGRAPHY SYSTEM AND METHOD FOR PROCESSING A TARGET, SUCH AS A WAFER Public/Granted day:2015-04-23
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