- 专利标题: Power MOSFET and manufacturing method thereof
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申请号: US14727872申请日: 2015-06-02
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公开(公告)号: US09761464B2公开(公告)日: 2017-09-12
- 发明人: Yi-Chi Chang
- 申请人: Excelliance MOS Corporation
- 申请人地址: TW Hsinchu County
- 专利权人: Excelliance MOS Corporation
- 当前专利权人: Excelliance MOS Corporation
- 当前专利权人地址: TW Hsinchu County
- 代理机构: Jianq Chyun IP Office
- 优先权: TW104112061A 20150415
- 主分类号: H01L23/053
- IPC分类号: H01L23/053 ; H01L21/48 ; H01L21/78 ; H01L23/00
摘要:
A power MOSFET includes a substrate, a dielectric layer, solder balls, first and second patterned-metal layers. The substrate includes an active surface, a back surface, a source region and a gate region on the active surface, and a drain region on the back surface. The first patterned-metal layer disposed on the active surface includes a source electrode, a gate electrode, a drain electrode and a connecting trace. The source and gate electrodes electrically connect the source and gate regions. The connecting trace located at an edge of the substrate electrically connects the drain electrode. The dielectric layer disposed on the active surface exposes the first patterned-metal layer. The second patterned-metal layer includes UBM layers covering the source, gate and drain electrodes and a connecting metal layer covering the connecting trace and extending to the edge to electrically connect the drain region. The solder balls are disposed on the UBM layers.
公开/授权文献
- US20160307835A1 POWER MOSFET AND MANUFACTURING METHOD THEREOF 公开/授权日:2016-10-20
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