Invention Grant
- Patent Title: Manufacturing method of array substrate with reduced number of patterning processes array substrate and display device
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Application No.: US14646925Application Date: 2014-10-01
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Publication No.: US09761616B2Publication Date: 2017-09-12
- Inventor: Chunping Long , Yinan Liang , Lujiang Huangfu
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Banner & Witcoff, Ltd.
- Priority: CN201410308003 20140630
- International Application: PCT/CN2014/088082 WO 20141001
- International Announcement: WO2016/000342 WO 20160107
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/28 ; H01L29/66 ; H01L29/786 ; H01L21/285 ; H01L27/32

Abstract:
An array substrate, a manufacturing method thereof and a display device are disclosed. Patterns comprising a gate, a gate insulating layer and a polysilicon active layer are formed on a base substrate by single patterning process. A passivation layer is formed on the substrate surface formed with the patterns, and patterns of a first via and a second via are formed on a surface of the passivation layer by single patterning process. Patterns of a source, a drain and a pixel electrode are formed on the substrate surface formed with the patterns by single patterning process. The source is electrically connected with the polysilicon active layer through the first via, and the drain is electrically connected with the polysilicon active layer through the second via. A pattern of pixel defining layer is formed on the substrate surface formed with the patterns by single patterning process.
Public/Granted literature
- US20160254298A1 Array Substrate, Manufacturing Method Thereof, and Display Device Public/Granted day:2016-09-01
Information query
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