Invention Grant
- Patent Title: Method of manufacturing thin film transistor, thin film transistor manufactured by the method, and electronic device comprising the thin film transistor
-
Application No.: US15168342Application Date: 2016-05-31
-
Publication No.: US09761818B2Publication Date: 2017-09-12
- Inventor: Youngjun Yun , Joo Young Kim , Byong Gwon Song , Jaewon Jang , Jiyoung Jung , Ajeong Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2015-0191451 20151231
- Main IPC: H01L51/05
- IPC: H01L51/05 ; H01L51/00 ; H01L27/28

Abstract:
A method of manufacturing a thin film transistor includes forming a gate electrode, forming a gate insulating layer on the gate electrode, forming an organic semiconductor layer on the gate insulating layer, forming a solvent selective photosensitive layer on the organic semiconductor layer, forming an organic semiconductor pattern and a solvent selective photosensitive pattern by simultaneously patterning the organic semiconductor layer and the solvent selective photosensitive layer, respectively, and forming a source electrode and a drain electrode on the organic semiconductor pattern and the solvent selective photosensitive pattern, the source electrode and the drain electrode being electrically connected to the organic semiconductor pattern.
Public/Granted literature
Information query
IPC分类: