- 专利标题: Defect reduction in seeded aluminum nitride crystal growth
-
申请号: US14684754申请日: 2015-04-13
-
公开(公告)号: US09771666B2公开(公告)日: 2017-09-26
- 发明人: Robert T. Bondokov , Leo J. Schowalter , Kenneth Morgan , Glen A. Slack , Shailaja P. Rao , Shawn Robert Gibb
- 申请人: Crystal IS, Inc.
- 申请人地址: US NY Green Island
- 专利权人: CRYSTAL IS, INC.
- 当前专利权人: CRYSTAL IS, INC.
- 当前专利权人地址: US NY Green Island
- 代理机构: Morgan, Lewis & Bockius LLP
- 主分类号: C30B23/00
- IPC分类号: C30B23/00 ; C30B23/02 ; C30B29/40
摘要:
Bulk single crystal of aluminum nitride (AlN) having an areal planar defect density≦100 cm−2. Methods for growing single crystal aluminum nitride include melting an aluminum foil to uniformly wet a foundation with a layer of aluminum, the foundation forming a portion of an AlN seed holder, for an AlN seed to be used for the AlN growth. The holder may consist essentially of a substantially impervious backing plate.
公开/授权文献
信息查询