Invention Grant
- Patent Title: Memristor structures
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Application No.: US14914808Application Date: 2013-09-05
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Publication No.: US09793473B2Publication Date: 2017-10-17
- Inventor: Shih-Yuan Wang , Jianhua Yang , Minxian Max Zhang , Alexandre M. Bratkovski , R. Stanley Williams
- Applicant: Hewlett Packard Enterprise Development LP
- Applicant Address: US TX Houston
- Assignee: Hewlett Packard Enterprise Development LP
- Current Assignee: Hewlett Packard Enterprise Development LP
- Current Assignee Address: US TX Houston
- Agency: Hewlett Packard Enterprise Patent Department
- International Application: PCT/US2013/058170 WO 20130905
- International Announcement: WO2015/034494 WO 20150312
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L45/00

Abstract:
A memristor structure may be provided that includes a first electrode, a second electrode, and a buffer layer disposed on the first electrode. The memristor structure may include a switching layer interposed between the second electrode and the buffer layer to form, when a voltage is applied, a filament or path that extends from the second electrode to the buffer layer and to form a Schottky-like contact or a heterojunction between the filament and the buffer layer.
Public/Granted literature
- US20160218285A1 Memristor Structures Public/Granted day:2016-07-28
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