发明授权
- 专利标题: Semiconductor device including a circuit to compensate for parasitic inductance
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申请号: US13048501申请日: 2011-03-15
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公开(公告)号: US09793889B2公开(公告)日: 2017-10-17
- 发明人: Reinhold Bayerer , Piotr Luniewski
- 申请人: Reinhold Bayerer , Piotr Luniewski
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 代理机构: Dicke, Billig & Czaja, PLLC
- 主分类号: H03K17/16
- IPC分类号: H03K17/16 ; H03K17/687 ; H03K19/003 ; H02M1/088
摘要:
A semiconductor device includes a first transistor, a second transistor coupled in parallel with the first transistor, and a first parasitic inductance between an emitter of the first transistor and an emitter of the second transistor. The semiconductor device includes a first circuit configured to provide a first gate driver signal to the first transistor based on a common driver signal and a second circuit configured to provide a second gate driver signal to the second transistor based on the common driver signal. The first circuit and the second circuit are configured to compensate for a voltage drop across the first parasitic inductance such that the first gate driver signal and the second gate driver signal are in phase with and at the same magnitude as the common driver signal.
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