Invention Grant
- Patent Title: Composition for forming topcoat layer and resist pattern formation method employing the same
-
Application No.: US14549911Application Date: 2014-11-21
-
Publication No.: US09804493B2Publication Date: 2017-10-31
- Inventor: Hyun-woo Kim , Cheol hong Park , Tetsuo Okayasu , Xiaowei Wang , Georg Pawlowski , Yusuke Hama
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-do LU Luxembourg
- Assignee: Samsung Electronics Co., LTD.,AZ Electronics Materials (Luxembourg) S.A.R.L.
- Current Assignee: Samsung Electronics Co., LTD.,AZ Electronics Materials (Luxembourg) S.A.R.L.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-do LU Luxembourg
- Agency: Lee & Morse, P.C.
- Priority: JP2013-242092 20131122; KR10-2014-0042023 20140408
- Main IPC: G03F7/09
- IPC: G03F7/09 ; G03F7/20 ; C09D5/00 ; C09D7/12 ; G03F7/11
Abstract:
Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including a graphene derivative including a hydrophilic group, and a solvent; heating the composition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution.
Public/Granted literature
- US09766544B2 Composition for forming topcoat layer and resist pattern formation method employing the same Public/Granted day:2017-09-19
Information query
IPC分类:
