公开(公告)号：US09804493B2

公开(公告)日：2017-10-31

申请号：US14549911

申请日：2014-11-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyun-woo Kim ,  Cheol hong Park ,  Tetsuo Okayasu ,  Xiaowei Wang ,  Georg Pawlowski ,  Yusuke Hama

IPC: G03F7/09 ,  G03F7/20 ,  C09D5/00 ,  C09D7/12 ,  G03F7/11

CPC classification number: G03F7/2004 ,  C08K3/042 ,  C09D5/00 ,  C09D7/40 ,  C09D7/62 ,  G03F7/091 ,  G03F7/11

Abstract: Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including a graphene derivative including a hydrophilic group, and a solvent; heating the composition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution.

公开(公告)号：US09766544B2

公开(公告)日：2017-09-19

申请号：US14549911

申请日：2014-11-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyun-woo Kim ,  Cheol hong Park ,  Tetsuo Okayasu ,  Xiaowei Wang ,  Georg Pawlowski ,  Yusuke Hama

IPC: G03F7/09 ,  G03F7/20 ,  C09D5/00 ,  C09D7/12 ,  G03F7/11

Abstract: Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including a graphene derivative including a hydrophilic group, and a solvent; heating the composition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution.