Invention Grant
- Patent Title: Manufacturing method of thin film transistor array panel and thin film transistor array panel
-
Application No.: US15140725Application Date: 2016-04-28
-
Publication No.: US09806100B2Publication Date: 2017-10-31
- Inventor: Joon-Hwa Bae , Jong Chan Lee , Woong Hee Jeong , In Sun Hwang
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2015-0141228 20151007
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/04 ; H01L29/16
Abstract:
A manufacturing method of a thin film transistor array panel according to an exemplary embodiment of the present invention includes forming an amorphous silicon thin film on a substrate. A lower region of the amorphous silicon thin film is crystallized to form a polycrystalline silicon thin film by irradiating a laser beam with an energy density of from about 150 mj/cm2 to about 250 mj/cm2 to the amorphous silicon thin film.
Public/Granted literature
- US20170104015A1 MANUFACTURING METHOD OF THIN FILM TRANSISTOR ARRAY PANEL AND THIN FILM TRANSISTOR ARRAY PANEL Public/Granted day:2017-04-13
Information query
IPC分类:
