Invention Grant
- Patent Title: Photoresist polymers and photoresist compositions
-
Application No.: US15461211Application Date: 2017-03-16
-
Publication No.: US09810982B2Publication Date: 2017-11-07
- Inventor: Jin Park , Hyun-Woo Kim , Jin-Kyu Han
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2014-0167424 20141127
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/16 ; G03F7/32 ; G03F7/36 ; G03F7/004 ; G03F7/016 ; G03F7/20 ; H01L29/423 ; H01L21/027
Abstract:
A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.
Public/Granted literature
- US20170184966A1 PHOTORESIST POLYMERS AND PHOTORESIST COMPOSITIONS Public/Granted day:2017-06-29
Information query
IPC分类:
