Invention Grant
- Patent Title: Wafer inspection with focus volumetric method
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Application No.: US15001158Application Date: 2016-01-19
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Publication No.: US09816940B2Publication Date: 2017-11-14
- Inventor: Grace H. Chen , Keith Buckley Wells , Markus B. Huber , Se Baek Oh
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Kwan & Olynick, LLP
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/88 ; G01N21/95

Abstract:
Disclosed are methods and apparatus for detecting defects in a semiconductor sample. An inspection tool is used to collect intensity data sets at a plurality of focus settings from each of a plurality of xy positions of the sample. A polynomial equation having a plurality of coefficients is extracted for each of the xy position's collected intensity data sets as a function of focus setting. Each of the coefficients' set of values for the plurality of xy positions is represented with a corresponding coefficient image plane. A target set of coefficient image planes and a reference set of coefficient image planes are then analyzed to detect defects on the sample.
Public/Granted literature
- US20160209334A1 WAFER INSPECTION WITH FOCUS VOLUMETRIC METHOD Public/Granted day:2016-07-21
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