Invention Grant
- Patent Title: Mold release treatment method and method for producing anti-reflective film
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Application No.: US14387623Application Date: 2013-03-25
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Publication No.: US09821494B2Publication Date: 2017-11-21
- Inventor: Hidekazu Hayashi
- Applicant: Sharp Kabushiki Kaisha
- Applicant Address: JP Osaka
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Osaka
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2012-069229 20120326
- International Application: PCT/JP2013/058531 WO 20130325
- International Announcement: WO2013/146656 WO 20131003
- Main IPC: B29C33/00
- IPC: B29C33/00 ; B29C33/62 ; B29C59/16 ; B29C59/02 ; B29C33/42 ; B29C33/58 ; B29C33/64 ; C25D1/22 ; B29L11/00 ; B29K33/00

Abstract:
A mold release processing method according to an embodiment of the present invention includes the steps of: (a) providing a mold releasing agent, including a fluorine-based silane coupling agent and a solvent, and a mold of which the surface has a porous alumina layer; (b) applying the mold releasing agent onto the surface; and (c) heating, either before or after the step (b), the surface to a temperature not less than 40° C. and less than 100° C. in an ambient with a relative humidity of 50% or more.
Public/Granted literature
- US20150321386A1 MOLD RELEASE TREATMENT METHOD AND METHOD FOR PRODUCING ANTI-REFLECTIVE FILM Public/Granted day:2015-11-12
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