Invention Grant
- Patent Title: Non-photosensitive resin composition
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Application No.: US14435918Application Date: 2013-10-04
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Publication No.: US09823391B2Publication Date: 2017-11-21
- Inventor: Takahiro Sakaguchi , Isao Adachi
- Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-233995 20121023
- International Application: PCT/JP2013/077149 WO 20131004
- International Announcement: WO2014/065100 WO 20140501
- Main IPC: G02B3/00
- IPC: G02B3/00 ; C08J5/18 ; G02B1/12 ; G02B1/14 ; C08F220/30 ; C08F220/32 ; G02B1/04 ; C08F220/20 ; C08F220/58 ; C08L63/00 ; C08L33/14 ; G02B1/10 ; G02B5/20

Abstract:
A non-photosensitive resin composition including: a self-cross-linkable copolymer having structural units of Formulae (1) and (2): wherein each R0 is independently a hydrogen atom or methyl group; X is an —O— group or an —NH— group; R1 is a single bond or a C1-6 alkylene group; R2 is a C1-6 alkyl group; a is an integer of 1 to 5, b is an integer of 0 to 4, and when a and b satisfy 1≦a+b≦5, and b is 2, 3, or 4, such R2 optionally differ from each other; R3 is a divalent organic group of Formula (I), Formula (II), or Formula (III), and R4 is an organic group having an epoxy group: wherein c is an integer of 0 to 3, d is an integer of 1 to 3, and each e is independently an integer of 2 to 6; and a solvent.
Public/Granted literature
- US20150338556A1 NON-PHOTOSENSITIVE RESIN COMPOSITION Public/Granted day:2015-11-26
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