A radial spacing, between two rotating cylindrical embossing tools, is adjustable, in an embossing device (14) having: an armature (19, 21); a first structure (16, 24, 26, 27, 29) which is movably mounted in translation relative to the armature (19, 21), which has a first rotating cylindrical tool (16); a second structure (17, 22, 28, 31) mounted in a fixed manner on the armature (19, 21) and which is provided with a second rotating cylindrical tool (17). A method includes steps of: pushing (T) on the first structure to move it closer to the second structure by leaning on the armature (19, 21) to adjust a radial space, or pulling (P) on the first structure (16, 24, 26, 27, 29) in order to move it away from the second structure (17, 22, 28, 31) by leaning on the armature (19, 21) in order to finely adjust the radial spacing between the first and the second tools (16, 17).