Invention Grant
- Patent Title: Exposure method, exposure device for performing the method and manufacturing method of display substrate using the method
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Application No.: US14740743Application Date: 2015-06-16
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Publication No.: US09841686B2Publication Date: 2017-12-12
- Inventor: Ik-Han Oh , Seung-Kyu Lee , Hyeon-Min Cho
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2014-0192085 20141229
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
An exposure method includes exposing a substrate to form a first pattern on a first layer, measuring a first alignment value of the first pattern, generating first correction data by using the first alignment value, storing the first correction data and exposing the substrate to form a second pattern on a second layer disposed on the first layer by using the first correction data.
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