Invention Grant
- Patent Title: Method for producing thin film having high refractive index and high transparency, and thin film produced by the method
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Application No.: US14914684Application Date: 2014-08-20
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Publication No.: US09845394B2Publication Date: 2017-12-19
- Inventor: Kimihiro Matsukawa , Seiji Watase , Koji Mitamura , Manabu Hirata
- Applicant: OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE , DAIHACHI CHEMICAL INDUSTRY CO., LTD.
- Applicant Address: JP Osaka JP Osaka
- Assignee: OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE,DAIHACHI CHEMICAL INDUSTRY CO., LTD.
- Current Assignee: OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE,DAIHACHI CHEMICAL INDUSTRY CO., LTD.
- Current Assignee Address: JP Osaka JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2013-176163 20130827
- International Application: PCT/JP2014/071712 WO 20140820
- International Announcement: WO2015/029844 WO 20150305
- Main IPC: C07F7/00
- IPC: C07F7/00 ; C09D4/00 ; B05D3/02 ; B05D3/06 ; B05D7/02 ; C03C17/25 ; C08F230/02 ; C09D5/00 ; G02B1/00

Abstract:
Provided are a method for easily and quickly producing a patterned thin film having a high refractive index and a high transparency, and a highly refractive thin film produced by the method. The method comprises a first step: a step of forming, on a substrate, a coating using a sol containing a metal oxide modified with a phosphorus compound represented by the following formula (1): (wherein R1 is a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; R2 is a divalent organic residue; and n is 1 or 2); a second step: a step of curing the coating on the substrate obtained in the first step by light irradiation; and a third step: a step of further adding energy to the cured film obtained in the second step by heating and/or light irradiation.
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