Invention Grant
- Patent Title: Anti-reflection film and production method therefor
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Application No.: US14763562Application Date: 2014-01-27
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Publication No.: US09851473B2Publication Date: 2017-12-26
- Inventor: Atsushi Kishi , Tomonori Ueno , Hiroki Kuramoto
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Ibaraki-shi
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Ibaraki-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2013-014457 20130129
- International Application: PCT/JP2014/051656 WO 20140127
- International Announcement: WO2014/119506 WO 20140807
- Main IPC: G02B1/116
- IPC: G02B1/116 ; C23C14/34 ; B32B7/02 ; B32B27/06 ; B32B27/20 ; G02B1/111 ; G02B27/00 ; G02B5/30 ; C23C14/08

Abstract:
There is provided an anti-reflection film that has an excellent reflection characteristic (low reflectivity) in a wide spectrum and has an excellent reflection hue that is close to neutral, and a method by which such anti-reflection film can be produced with high productivity and at a low cost. An anti-reflection film according to the present invention includes: a substrate; and a medium-refractive index layer, a high-refractive index layer, and a low-refractive index layer in the stated order from a substrate side. A refractive index nS of the substrate, a refractive index nM of the medium-refractive index layer, and a refractive index nH of the high-refractive index layer satisfy the following expression (1): n H - 1 n H + 1 - 1 - 4 n M 2 n S n M 2 ( 1 + n S ) 2 - ( 1 - n M 2 ) ( n M 2 - n S 2 ) ≧ 0.02 ( 1 ) where the refractive index nS of the substrate, the refractive index nM of the medium-refractive index layer, and the refractive index nH of the high-refractive index layer have a relationship of nH>nM>nS.
Public/Granted literature
- US20150355383A1 ANTI-REFLECTION FILM AND PRODUCTION METHOD THEREFOR Public/Granted day:2015-12-10
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