- 专利标题: SiC single crystal and production method thereof
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申请号: US13428395申请日: 2012-03-23
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公开(公告)号: US09856582B2公开(公告)日: 2018-01-02
- 发明人: Mina Ryo , Yoshiyuki Yonezawa , Takeshi Suzuki
- 申请人: Mina Ryo , Yoshiyuki Yonezawa , Takeshi Suzuki
- 申请人地址: JP Kawasaki-shi
- 专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人地址: JP Kawasaki-shi
- 代理机构: Rossi, Kimms & McDowell LLP
- 优先权: JP2009-224291 20090929
- 主分类号: C30B17/00
- IPC分类号: C30B17/00 ; C30B29/36 ; C30B9/10
摘要:
A method is disclosed with provides stable growth of SiC single crystals, particularly 4H—SiC single crystals, with an effective crystal growth rate for a prolonged time even at a low temperature range of 2000° C. or lower. A raw material containing Si, Ti and Ni is charged into a crucible made of graphite and heat-melted to obtain a solvent. At the same time, C is dissolved out from the crucible into the solvent to obtain a melt. A SiC seed crystal substrate is then brought into contact with the melt such that SiC is supersaturated in the melt in the vicinity of the surface of the SiC seed crystal substrate, thereby allowing growth and production of an SiC single crystal on the SiC seed crystal substrate.
公开/授权文献
- US20120237428A1 SIC SINGLE CRYSTAL AND PRODUCTION METHOD THEREOF 公开/授权日:2012-09-20
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