- 专利标题: Method of inspecting a substrate
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申请号: US13977499申请日: 2011-12-29
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公开(公告)号: US09885669B2公开(公告)日: 2018-02-06
- 发明人: Soo-Young Cho , Hee-Wook You , Bong-Ha Hwang , Hee-Tae Kim
- 申请人: Soo-Young Cho , Hee-Wook You , Bong-Ha Hwang , Hee-Tae Kim
- 申请人地址: KR Seoul
- 专利权人: KOH YOUNG TECHNOLOGY INC.
- 当前专利权人: KOH YOUNG TECHNOLOGY INC.
- 当前专利权人地址: KR Seoul
- 代理机构: Kile Park Reed & Houtteman PLLC
- 优先权: KR10-2010-0138104 20101229; KR10-2011-0143703 20111227
- 国际申请: PCT/KR2011/010316 WO 20111229
- 国际公布: WO2012/091494 WO 20120705
- 主分类号: G01B11/25
- IPC分类号: G01B11/25 ; G01B11/06 ; G01N21/95 ; H05K13/08
摘要:
A method of inspecting a substrate is disclosed. The method is performed by a substrate-inspecting apparatus having at least one projecting module projecting a patterned light onto a substrate fixed on a stage and an inspecting module with a camera capturing an image, and inspecting a plurality of inspection regions of the substrate step by step. The method comprises, setting an inspection order of the inspecting regions according to a lengthwise direction of the substrate, estimating height displacement of a target inspection region by using a tendency information regarding at least one previous inspection region that is already inspected, adjusting height of the inspecting module by using the estimated height displacement of the target inspection region, and inspecting the target inspection region by using the inspecting module of which height is adjusted. Therefore, inspection time is reduced.
公开/授权文献
- US20140009601A1 METHOD OF INPSECTING A SUBSTRATE 公开/授权日:2014-01-09
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