Invention Grant
- Patent Title: Method of manufacturing a mask
-
Application No.: US14994404Application Date: 2016-01-13
-
Publication No.: US09885953B2Publication Date: 2018-02-06
- Inventor: Jin-Seok Heo , Chang-Min Park , Seok-Hwan Oh , Jeong-Ho Yeo
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2011-0030993 20110405
- Main IPC: B29C43/02
- IPC: B29C43/02 ; G03F7/00 ; B82Y10/00 ; B82Y40/00 ; B29C35/08 ; B29L31/00
Abstract:
A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
Public/Granted literature
- US20160131970A1 METHOD OF MANUFACTURING A MASK Public/Granted day:2016-05-12
Information query
