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公开(公告)号：US09885953B2
公开(公告)日：2018-02-06
申请号：US14994404
申请日：2016-01-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jin-Seok Heo , Chang-Min Park , Seok-Hwan Oh , Jeong-Ho Yeo
CPC classification number: G03F7/0002 , B29C35/0805 , B29C2035/0827 , B29L2031/737 , B82Y10/00 , B82Y40/00
Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
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公开(公告)号：US11249662B2
公开(公告)日：2022-02-15
申请号：US16914724
申请日：2020-06-29
Applicant: Samsung Electronics Co., Ltd.
Inventor： Wang-Soo Kim , Jung-Hwan Choi , Ki-Duk Park , Yoo-Chang Sung , Jin-Sung Youn , Chang-Kyo Lee , Ju-Ho Jeon , Jin-Seok Heo
IPC: G06F12/00 , G06F3/06 , H04L25/03 , G11C29/02 , G11C5/04 , G11C29/12 , G11C11/407 , H01L25/18 , G11C29/44
Abstract: A memory module includes a plurality of semiconductor memory devices associated with a same module board. The plurality of semiconductor memory devices configured to simultaneously perform a training operation, the plurality of semiconductor memory devices including a reception interface circuit configured to perform the training operation to search for selected equalization coefficients of an equalizer based on a training pattern from a memory controller, and transmit a training information signal to the memory controller in a training mode in response to a training command from the memory controller, the training information signal including the selected equalization coefficients.
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公开(公告)号：US20190179553A1
公开(公告)日：2019-06-13
申请号：US16103078
申请日：2018-08-14
Applicant: Samsung Electronics Co., Ltd.
Inventor： Wang-Soo Kim , Jung-Hwan Choi , Ki-Duk Park , Yoo-Chang Sung , Jin-Sung Youn , Chang-Kyo Lee , Ju-Ho Jeon , Jin-Seok Heo
Abstract: A memory module includes a plurality of semiconductor memory devices associated with a same module board. The plurality of semiconductor memory devices configured to simultaneously perform a training operation, the plurality of semiconductor memory devices including a reception interface circuit configured to perform the training operation to search for selected equalization coefficients of an equalizer based on a training pattern from a memory controller, and transmit a training information signal to the memory controller in a training mode in response to a training command from the memory controller, the training information signal including the selected equalization coefficients.
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Patent Agency Ranking
公开(公告)号：US09635749B2
公开(公告)日：2017-04-25
申请号：US14995398
申请日：2016-01-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sung-Joo Kim , Jin-Seok Heo , Do-Hyun Seo , Da-Hae Lee , Jae-Pil Lee , Sung-Jo Hwang
CPC classification number: H05G2/006 , G21K2201/065 , H01S3/2232 , H05G2/005 , H05G2/008
Abstract: An apparatus for generating extreme ultraviolet light includes a droplet generator which provides a droplet to react with light from a light source to generate extreme ultraviolet light, a droplet collector which collects the droplet, and a droplet detector which includes a plurality of pressure sensors, the pressure sensors detect a position of the droplet provided to the droplet collecting unit.
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公开(公告)号：US10725682B2
公开(公告)日：2020-07-28
申请号：US16103078
申请日：2018-08-14
Applicant: Samsung Electronics Co., Ltd.
Inventor： Wang-Soo Kim , Jung-Hwan Choi , Ki-Duk Park , Yoo-Chang Sung , Jin-Sung Youn , Chang-Kyo Lee , Ju-Ho Jeon , Jin-Seok Heo
IPC: G06F12/00 , G06F3/06 , H04L25/03 , G11C29/02 , G11C5/04 , G11C29/12 , G11C11/407 , H01L25/18 , G11C29/44
Abstract: A memory module includes a plurality of semiconductor memory devices associated with a same module board. The plurality of semiconductor memory devices configured to simultaneously perform a training operation, the plurality of semiconductor memory devices including a reception interface circuit configured to perform the training operation to search for selected equalization coefficients of an equalizer based on a training pattern from a memory controller, and transmit a training information signal to the memory controller in a training mode in response to a training command from the memory controller, the training information signal including the selected equalization coefficients.
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公开(公告)号：US10283186B2
公开(公告)日：2019-05-07
申请号：US15787101
申请日：2017-10-18
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seong-Hwan Jeon , Kyung-Soo Ha , Jin-Seok Heo , In-Dal Song , Jung-Hwan Choi
IPC: G11C11/24 , G11C11/402 , G11C7/22 , G11C11/22 , G11C7/10 , G11C11/4093
Abstract: A data alignment circuit of a semiconductor memory device including: a data sampling circuit configured to receive a data sequence and an internal data strobe signal, wherein the data sampling circuit samples the data sequence based on the internal data strobe signal to generate first and second data sequences; a division circuit configured to receive a clock signal and the internal data strobe signal, divide the clock signal to produce a divided clock signal and output an alignment control signal by sampling the divided clock signal based on the internal data strobe signal; and a data alignment block configured to receive the first and second data sequences, and the alignment control signal, and align the first and second data sequences in parallel to output internal data.
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公开(公告)号：US20160131970A1
公开(公告)日：2016-05-12
申请号：US14994404
申请日：2016-01-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jin-Seok Heo , Chang-Min Park , Seok-Hwan Oh , Jeong-Ho Yeo
CPC classification number: G03F7/0002 , B29C35/0805 , B29C2035/0827 , B29L2031/737 , B82Y10/00 , B82Y40/00
Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
Abstract translation: 制造掩模的方法包括将具有设计图案的模板的上表面划分为多个区域，模板布置在掩模基板上的聚合物层上，校正区域之间的变形区域，将聚合物层与 该模板形成对应于聚合物层上的设计图案的掩模图案; 并固化掩模图案。
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公开(公告)号：US08912103B2
公开(公告)日：2014-12-16
申请号：US13681468
申请日：2012-11-20
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jin-Seok Heo , Jeong-Ho Yeo
IPC: H01L21/00 , H01L21/308 , H01L21/027 , B82Y10/00 , G03F7/00
CPC classification number: H01L21/3086 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0271 , H01L21/0273 , Y10S438/942 , Y10T29/49
Abstract: A method of fabricating a nanoimprint lithography template includes installing a reticle on a reticle stage of scanning lithography equipment having a light source, the reticle stage and a template stage, mounting a template substrate on the template stage, and scanning the template substrate with light from the light source in an exposure process in which the light passes through the reticle and impinges the template substrate at an oblique angle of incidence.
Abstract translation: 制造纳米压印光刻模板的方法包括在具有光源，标线片台和模板台的扫描光刻设备的标线片平台上安装掩模版，在模板台上安装模板基板，并用来自 曝光过程中的光源，其中光通过掩模版并以倾斜的入射角撞击模板基板。
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