The present disclosure is directed to overlay metrology with targets including “disappearing” or sacrificial layers that leave no optical trace impacting OVL measurement when processed. In an embodiment, an overlay metrology target may include at least one overlay target structure inducing an optical characteristic and at least one secondary overlay target structure inducing a temporary optical characteristic. The at least one secondary overlay target structure being removable by a lithographic process and/or by etch or clean process, where removal of the at least one secondary overlay target structure removes the temporary optical characteristic. That is, the secondary target structure or “layer” leaves no optical trace impacting OVL measurement when removed, thereby allowing another target structure (e.g., a tertiary target structure or layer) to be printed in a region previously occupied by at least a portion of the secondary target structure.