Invention Grant
- Patent Title: Single-wafer-type cleaning apparatus
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Application No.: US14983530Application Date: 2015-12-29
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Publication No.: US09887078B2Publication Date: 2018-02-06
- Inventor: Namsuk Kim , Ohhyung Kwon , Dae-Sung Kim , Jutaek Lim , Jaehyung Jung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR
- Agency: Renaissance IP Law Group LLP
- Priority: KR10-2015-0001264 20150106
- Main IPC: B08B3/00
- IPC: B08B3/00 ; H01L21/02 ; H01L21/67 ; H01L21/687
Abstract:
A single-wafer-type cleaning apparatus is provided. The single-wafer-type cleaning apparatus is configured to be capable of controlling electrostatic charges generated due to rotating a wafer during a semiconductor cleaning process and a defect caused by the electrostatic charges. The cleaning process uses an ionizer mounted on a chuck.
Public/Granted literature
- US20160197000A1 SINGLE-WAFER-TYPE CLEANING APPARATUS Public/Granted day:2016-07-07
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