- Patent Title: Solid-state imaging device and method of manufacturing the device
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Application No.: US14555153Application Date: 2014-11-26
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Publication No.: US09887231B2Publication Date: 2018-02-06
- Inventor: Kentaro Nakanishi , Junji Hirase , Kosaku Saeki , Yoshinori Takami , Takeshi Hidaka , Tokuhiko Tamaki
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2012-143040 20120626
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A solid-state imaging device includes unit pixels formed on a semiconductor substrate. Each of the unit pixels includes a photoelectric converter, a floating diffusion, a pinning layer, and a pixel transistor. The pixel transistor includes a gate electrode formed on the semiconductor substrate, a source diffusion layer, and a drain diffusion layer. At least one of the source diffusion layer or the drain diffusion layer functions as the floating diffusion. The pinning layer is covered by the floating diffusion at a bottom and a side at a channel of the pixel transistor. A conductivity type of the floating diffusion is opposite to that of the pinning layer.
Public/Granted literature
- US20150084106A1 SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE DEVICE Public/Granted day:2015-03-26
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