Invention Grant
- Patent Title: Emitter and method for manufacturing the same
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Application No.: US15079472Application Date: 2016-03-24
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Publication No.: US09887355B2Publication Date: 2018-02-06
- Inventor: Steffen Bieselt , Heiko Froehlich , Thoralf Kautzsch , Maik Stegemann , Mirko Vogt
- Applicant: Infineon Technologies Dresden GmbH
- Applicant Address: DE Dresden
- Assignee: Infineon Technologies Desden GmbH
- Current Assignee: Infineon Technologies Desden GmbH
- Current Assignee Address: DE Dresden
- Agency: Harrity & Harrity, LLP
- Priority: DE102015206745 20150415
- Main IPC: H01L27/15
- IPC: H01L27/15 ; H01L49/00 ; G01J3/00

Abstract:
A method for manufacturing an emitter comprises providing a semiconductor substrate having a main surface, the semiconductor substrate comprising a cavity adjacent to the main surface. A portion of the semiconductor substrate arranged between the cavity and the main surface of the semiconductor substrate forms a support structure. The method comprises arranging an emitting element at the support structure, the emitting element being configured to emit a thermal radiation of the emitter, wherein the cavity provides a reduction of a thermal coupling between the emitting element and the semiconductor substrate.
Public/Granted literature
- US20160308084A1 EMITTER AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-10-20
Information query
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