- 专利标题: Wiring substrate and method of manufacturing the same
-
申请号: US15293464申请日: 2016-10-14
-
公开(公告)号: US09899310B2公开(公告)日: 2018-02-20
- 发明人: Tatsuaki Denda
- 申请人: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- 申请人地址: JP Nagano-Shi
- 专利权人: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- 当前专利权人: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- 当前专利权人地址: JP Nagano-Shi
- 代理机构: Rankin, Hill & Clark LLP
- 优先权: JP2015-205242 20151019
- 主分类号: H05K1/11
- IPC分类号: H05K1/11 ; H01L23/498 ; H01L21/48 ; H01L21/56 ; H01L23/00 ; H01L23/31
摘要:
A wiring substrate includes an insulating layer, at least one via hole formed in the insulating layer, a first wiring layer formed on one surface of the insulating layer and having a droop portion at an end-side of the via hole, a second wiring layer formed on the other surface of the insulating layer, and a metal-plated layer formed in the via hole and configured to connect the second wiring layer and the droop portion of the first wiring layer. One surface of the insulating layer around the via hole is formed as a convex curved surface and the droop portion of the first wiring layer is arranged on the convex curved surface.
公开/授权文献
- US20170110394A1 WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 公开/授权日:2017-04-20
信息查询