发明授权
- 专利标题: Vertical memory devices having contact plugs contacting stacked gate electrodes
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申请号: US15001877申请日: 2016-01-20
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公开(公告)号: US09899394B2公开(公告)日: 2018-02-20
- 发明人: Sung-Min Hwang , Jee-Yong Kim , Dae-Seok Byeon
- 申请人: Sung-Min Hwang , Jee-Yong Kim , Dae-Seok Byeon
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Ward and Smith, P.A.
- 优先权: KR10-2015-0032969 20150310; KR10-2015-0070338 20150520
- 主分类号: H01L27/115
- IPC分类号: H01L27/115 ; H01L27/11578 ; H01L27/11575 ; H01L27/11573 ; H01L27/11565 ; H01L27/1157 ; H01L27/11563 ; H01L27/11582
摘要:
A vertical memory device includes a plurality of gate electrodes at a plurality of levels, respectively, spaced apart from each other in a vertical direction substantially perpendicular to a top surface of a substrate, a channel extending in the vertical direction on the substrate and penetrating through the gate electrodes, and a plurality of contact plugs extending in the vertical direction and contacting the gate electrodes, respectively. At least one second contact plug is formed on a first gate electrode among the plurality of gate electrodes, and extends in the vertical direction.
公开/授权文献
- US20160268264A1 VERTICAL MEMORY DEVICES 公开/授权日:2016-09-15
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