- 专利标题: Nitride semiconductor transistor device
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申请号: US15390590申请日: 2016-12-26
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公开(公告)号: US09899507B2公开(公告)日: 2018-02-20
- 发明人: Riichiro Shirota , Shinichiro Takatani
- 申请人: Riichiro Shirota , Shinichiro Takatani
- 代理机构: Kamrath IP Lawfirm, P.A.
- 代理商 Alan D. Kamrath
- 优先权: JP2016-000966 20160106
- 主分类号: H01L21/84
- IPC分类号: H01L21/84 ; H01L27/06 ; H01L29/20 ; H01L29/423 ; H01L29/739 ; H01L29/778 ; H01L21/335 ; H01L29/06 ; H01L29/205 ; H01L29/417 ; H01L29/51 ; H01L29/788 ; H01L29/792
摘要:
A nitride semiconductor transistor device provides a normally-off nitride semiconductor transistor device which is excellent in switching properties with less dispersion of the properties. The nitride semiconductor transistor device has a buffer layer, a GaN layer, and an AlGaN layer in turn grown on a substrate. A first insulating film, a charge storage layer, a second insulating film, and a control electrode are in turn grown on the AlGaN layer. A source electrode and a drain electrode are formed to sandwich the charge storage layer over the AlGaN layer. A threshold voltage to shut off an electric current flowing between the source and drain electrodes through a conductive channel induced at an interface of the AlGaN layer and the GaN layer is made positive by adjusting the charge stored in the charge storage layer.
公开/授权文献
- US20170194474A1 Nitride Semiconductor Transistor Device 公开/授权日:2017-07-06
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