Invention Grant
- Patent Title: Method and system for optimizing optical inspection of patterned structures
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Application No.: US15050613Application Date: 2016-02-23
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Publication No.: US09904993B2Publication Date: 2018-02-27
- Inventor: Boaz Brill
- Applicant: NOVA MEASURING INSTRUMENTS LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee Address: IL Rehovot
- Agency: Browdy and Neimark, P.L.L.C.
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00 ; G01B21/02 ; G03F7/20 ; G01B11/02 ; G06T7/80

Abstract:
A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.
Public/Granted literature
- US20160284077A1 METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED STRUCTURES Public/Granted day:2016-09-29
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