Invention Grant
- Patent Title: Method for manufacturing thin film transistor, thin film transistor, and array substrate and display device using the same
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Application No.: US14911213Application Date: 2015-07-20
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Publication No.: US09905580B2Publication Date: 2018-02-27
- Inventor: Ce Ning , Mingchao Li , Fangzhen Zhang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: CN201510152719 20150401
- International Application: PCT/CN2015/084446 WO 20150720
- International Announcement: WO2016/155155 WO 20161006
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L27/12 ; H01L29/786 ; H01L29/40 ; H01L29/66

Abstract:
The present disclosure relates to the field of display technology and provides a method for manufacturing a TFT, the TFT, an array substrate including the TFT, and a display device. The method includes steps of forming a pattern of a gate electrode on 5 a base substrate, forming a gate insulation layer on the base substrate, and forming patterns of a source electrode and a drain electrode arranged above the gate insulation layer. The method further includes forming an antioxidation metal protection layer on a surface or surfaces of the gate electrode, the source electrode and/or the drain electrode.
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Information query
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