- 专利标题: Circuits using gate-all-around technology
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申请号: US15479803申请日: 2017-04-05
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公开(公告)号: US09911819B2公开(公告)日: 2018-03-06
- 发明人: Chung-Hui Chen
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: WPAT, P.C., Intellectual Property Attorneys
- 代理商 Anthony King
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L29/423 ; H01L27/088 ; H01L29/78 ; H01L21/8234
摘要:
A semiconductor structure includes a first GAA transistor and a second GAA transistor. The first GAA transistor includes: a first top OD region, a first bottom OD region, and a first nanowire. A second GAA transistor includes: a second top OD region, a second bottom OD region, and a second nanowire. The first top OD region, the first bottom OD region, and the first nanowire are symmetrical with the second top OD region, the second bottom OD region, and the second nanowire respectively, the first GAA transistor is arranged to provide a first current to flow from the first top OD region to the first bottom OD region, and the second GAA transistor is arranged to provide a second current to flow from the second top OD region to the second bottom OD region.
公开/授权文献
- US20170207314A1 CIRCUITS USING GATE-ALL-AROUND TECHNOLOGY 公开/授权日:2017-07-20
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