Invention Grant
- Patent Title: Semiconductor device having dummy active fin patterns
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Application No.: US15372840Application Date: 2016-12-08
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Publication No.: US09929156B2Publication Date: 2018-03-27
- Inventor: In Wook Oh , Jae Seok Yang , Jong Hyun Lee , Hyun Jae Lee , Sung Wook Hwang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2016-0041563 20160405
- Main IPC: H01L27/08
- IPC: H01L27/08 ; H01L27/02 ; H01L23/52 ; H01L29/66 ; G06F17/50 ; H01L27/088 ; H01L23/528

Abstract:
A semiconductor device includes circuit active fin lines and circuit gate lines intersecting each other in a circuit active region, dummy active fin lines and dummy gate lines intersecting each other in a dummy active region, the active fin lines and the dummy active fin lines having same width and pitch, and the circuit gate lines and the dummy gate lines having same width and pitch, wherein at least some of the dummy active fin lines are aligned with and collinear with respective circuit active fin lines, and at least some of the dummy gate lines are aligned with and collinear with respective circuit gate lines.
Public/Granted literature
- US20170287909A1 LAYOUT METHOD AND SEMICONDUCTOR DEVICE Public/Granted day:2017-10-05
Information query
IPC分类: