- Patent Title: Method of manufacturing an infrared detector having a micro-cavity and a low refraction index step at an interface with a transparent cap, and associated infrared detector
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Application No.: US15400278Application Date: 2017-01-06
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Publication No.: US09929196B2Publication Date: 2018-03-27
- Inventor: Michel Vilain , Jérôme Favier , Jean-Jacques Yon , Laurent Frey
- Applicant: Ulis , Commissariat A L'Energie Atomique Et Aux Energies Alternatives
- Applicant Address: FR Veurey Voroize FR Paris
- Assignee: Ulis,Commissariat A L'Energie Atomique Et Aux Energies Alternatives
- Current Assignee: Ulis,Commissariat A L'Energie Atomique Et Aux Energies Alternatives
- Current Assignee Address: FR Veurey Voroize FR Paris
- Agency: Burr & Brown, PLLC
- Priority: FR1650438 20160120
- Main IPC: G01J5/20
- IPC: G01J5/20 ; G01J5/02 ; H01L27/146 ; G01J5/04

Abstract:
A method of manufacturing a detector capable of detecting a wavelength range [λ8; λ14] centered on a wavelength λ10, including: forming said device on a substrate by depositing a sacrificial layer totally embedding said device; forming, on the sacrificial layer, a cap including first, second, and third optical structures transparent in said range [Δ8; λ14], the second and third optical structures having equivalent refraction indexes at wavelength λ10 respectively greater than or equal to 3.4 and smaller than or equal to 2.3; forming a vent of access to the sacrificial layer through a portion of the cap, and then applying, through the vent, an etching to totally remove the sacrificial layer.
Public/Granted literature
- US20170207265A1 METHOD OF MANUFACTURING AN ELECTROMAGNETIC RADIATION DETECTOR WITH MICRO-ENCAPSULATION Public/Granted day:2017-07-20
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