Invention Grant
- Patent Title: Culling using masked depths for MSAA
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Application No.: US14141606Application Date: 2013-12-27
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Publication No.: US09934604B2Publication Date: 2018-04-03
- Inventor: Jon N. Hasselgren , Magnus Andersson
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Trop Pruner & Hu, P.C.
- Main IPC: G06T15/40
- IPC: G06T15/40

Abstract:
In accordance with some embodiments, a full per sample coverage mask may be used for a subset of the pixels in the tile, thereby enabling pixels that belong to multiple depth ranges to be handled. This makes the depth bounds a tighter fit for the true depth range of the tile and improves hierarchical depth culling efficiency when MSAA is used.
Public/Granted literature
- US20150187125A1 Culling Using Masked Depths for MSAA Public/Granted day:2015-07-02
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