Invention Grant
- Patent Title: Method of manufacturing semiconductor device
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Application No.: US14932470Application Date: 2015-11-04
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Publication No.: US09935232B2Publication Date: 2018-04-03
- Inventor: Gen Toyota , Shouta Inoue , Susumu Yamamoto , Takamasa Tanaka , Takamitsu Yoshida , Kazumasa Tanida
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Tokyo
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Tokyo
- Agency: White & Case LLP
- Priority: JP2015-049947 20150312
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L21/304 ; H01L21/683

Abstract:
According to one embodiment, a method of manufacturing a semiconductor device includes a step of grinding to thin a first semiconductor wafer on which a semiconductor device is formed in a state in which a surface of a second semiconductor wafer is fixed on a chuck table of a grinding device after bonding the first semiconductor wafer to the second semiconductor wafer. The method includes a step of fixing a surface of the first semiconductor wafer on the chuck table and grinding the surface of the second semiconductor wafer in a state in which the first semiconductor wafer is bonded to the second semiconductor wafer prior to the grinding step to thin the first semiconductor wafer.
Public/Granted literature
- US20160268469A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2016-09-15
Information query
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