Invention Grant
- Patent Title: System for positioning an object in lithography
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Application No.: US15039795Application Date: 2014-11-14
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Publication No.: US09946172B2Publication Date: 2018-04-17
- Inventor: Peter Paul Hempenius , Martijn Houben , Nicolaas Rudolf Kemper , Robertus Mathijs Gerardus Rijs , Paul Corné Henri De Wit , Stijn Willem Boere , Youssef Karel Maria De Vos , Frits Van Der Meulen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP13198939 20131220
- International Application: PCT/EP2014/074583 WO 20141114
- International Announcement: WO2015/090753 WO 20150625
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20

Abstract:
A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.
Public/Granted literature
- US20160377996A1 SYSTEM FOR POSITIONING AN OBJECT IN LITHOGRAPHY Public/Granted day:2016-12-29
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