- 专利标题: Extreme UV light generation apparatus and method
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申请号: US14879754申请日: 2015-10-09
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公开(公告)号: US09949354B2公开(公告)日: 2018-04-17
- 发明人: Takashi Saito , Fumio Iwamoto , Osamu Wakabayashi , Takayuki Yabu
- 申请人: Gigaphoton Inc.
- 申请人地址: JP Tochigi
- 专利权人: Gigaphoton Inc.
- 当前专利权人: Gigaphoton Inc.
- 当前专利权人地址: JP Tochigi
- 代理机构: Studebaker & Brackett PC
- 优先权: JP2013-106815 20130521
- 主分类号: H05G2/00
- IPC分类号: H05G2/00
摘要:
An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.
公开/授权文献
- US20160037616A1 EXTREME UV LIGHT GENERATION APPARATUS 公开/授权日:2016-02-04