A method and apparatus for producing a radio frequency absorber (RFA) or perfect microwave absorber (PMA) skin is described herein. A metamaterial layer may be applied to a low dielectric substrate. Resistive and capacitive components may then be added to the metamaterial layer. The metamaterial layer may then be formed into an RFA or PMA skin, which may then be applied to a multi-layered assembly for absorption of electromagnetic radiation in a frequency range such as the microwave frequency spectrum in a final product including but limited to cell phones, communication devices, or other electronic devices.