发明授权
- 专利标题: Dipping bath
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申请号: US14287758申请日: 2014-05-27
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公开(公告)号: US09962726B2公开(公告)日: 2018-05-08
- 发明人: WonChan Park , De-Hee Kim , Ye-Hoon Im
- 申请人: LG CHEM, LTD.
- 申请人地址: KR Seoul
- 专利权人: LG CHEM, LTD.
- 当前专利权人: LG CHEM, LTD.
- 当前专利权人地址: KR Seoul
- 代理机构: Dentons US LLP
- 优先权: KR10-2012-0073402 20120705
- 主分类号: B05C3/02
- IPC分类号: B05C3/02 ; B05C3/132 ; H01M2/14
摘要:
A dipping bath according to the present disclosure includes a body to hold a slurry for dip coating, an inlet installed to flow the slurry from an outside of the body to an inside, and an outlet installed to discharge the slurry from the inside of the body to the outside, and one end of the inlet placed inside the body may be disposed facing a side surface of the body at a distance and may be tilted to a predetermined angle in a direction toward a bottom surface of the body.According to the present disclosure, adjustment of an incidence angle of the slurry flowing into the bath through the inlet may increase a flow rate of the slurry toward the bottom surface, as well as allowing a uniform distribution of solids contained in the slurry circulating through the bath.
公开/授权文献
- US20140299053A1 DIPPING BATH 公开/授权日:2014-10-09
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